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Updated: Feb 16, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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Attainment of 40.5 pm spatial resolution using 300 kV scanning transmission electron microscope equipped with

Shigeyuki Morishita1, Ryo Ishikawa2, Yuji Kohno1

  • 1JEOL Ltd, 3-1-2 Musashino, Akishima, Tokyo196-8558, Japan.

Microscopy (Oxford, England)
|January 9, 2018
PubMed

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