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EUV polarimetry for thin film and surface characterization and EUV phase retarder reflector development
A E H Gaballah1, P Nicolosi1, Nadeem Ahmed1
1University of Padova, Department of Information Engineering, Via Gradenigo 6B, 35131 Padova, Italy.
Abstract:
The knowledge and the manipulation of light polarization state in the vacuum ultraviolet and extreme ultraviolet (EUV) spectral regions play a crucial role from materials science analysis to optical component improvements. In this paper, we present an EUV spectroscopic ellipsometer facility for polarimetry in the 90-160 nm spectral range. A single layer aluminum mirror to be used as a quarter wave retarder has been fully characterized by deriving the optical and structural properties from the amplitude component and phase difference δ measurements. The system can be suitable to investigate the properties of thin films and optical coatings and optics in the EUV region.
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