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Published on: June 2, 2017
Exploring the optical properties of Vernier phase yttrium oxyfluoride thin films grown by pulsed liquid injection
Shan-Ting Zhang1, Mircea Modreanu, Hervé Roussel
1Univ. Grenoble Alpes, CNRS, Grenoble INP, LMGP, F-38000 Grenoble, France. shanting.zhang@gmail.com jean-luc.deschanvres@grenoble-inp.fr.
Abstract:
In this work, we report on the first successful deposition of Vernier phase yttrium oxyfluoride (V-YOF) thin films on Si (100) wafers using pulsed liquid injection metal organic chemical vapor deposition (PLI-MOCVD). The formation of V-YOF has been confirmed by X-ray diffraction measurements and electron probe microanalysis. The infrared phonon modes of V-YOF thin films and their corresponding optical constants as inferred from spectroscopic ellipsometry are reported here for the first time. The V-YOF thin films are featured by a broad absorption band centering around 370-373 cm-1; their refractive index is located between those of YF3 and Y2O3, and which shows an intimate relationship with the oxygen content in the film. The luminescence properties of Er3+ doped V-YOF thin films are finally examined and compared with that of YF3. Our results highlight that the as-deposited V-YOF thin films by PLI-MOCVD serve as promising candidates as efficient host material for spectral conversion for photovoltaic applications.
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