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The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
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Deposition of Tin Oxide Thin Films by Successive Ionic Layer Adsorption Reaction Method and Its Characterization

Shipra Raj1, Sharad Kumar2, Suneel Kumar Srivastava2

  • 1Department of Chemistry, Birla Institute of Technology, Mesra, Ranchi 835215, Jharkand, India.

Journal of Nanoscience and Nanotechnology
|February 15, 2018
PubMed

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