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High Temperature Corrosion of TiAlCrSiN Films in N₂/0.1%H₂S Gas
Jae Chun Lee1, Poonam Yadav2, Dong Bok Lee2
1Department of Materials Science and Engineering, Myongji University, Yongin 17058, South Korea.
Abstract:
Nanomultilayered TiAlCrSiN film was corroded in N2/0.1%H2S-mixed gas at 900 °C for 5-300 h. It corroded to TiO2, α-Al2O3, and Cr2O3. From the early corrosion stage, not only the outward diffusion of Al, Ti, Cr, and Si but also the inward migration of oxygen occurred. As the corrosion proceeded, the outermost TiO2 layer, outer (Ti-depleted, (Al,Cr)-rich)-oxide layer, inner (Ti-rich, (Al,Cr)-depleted)-oxide layer, and partially oxidizing innermost film formed on the oxygenaffected film.
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