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Fast and Versatile Multiscale Patterning by Combining Template-Stripping with Nanotransfer Printing.

Raphael F Tiefenauer1, Klas Tybrandt1,2, Morteza Aramesh1

  • 1Laboratory of Biosensors and Bioelectronics , ETH Zürich , 8092 Zürich , Switzerland.

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|February 27, 2018
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Summary

A novel nanotransfer printing method allows scalable, cost-effective fabrication of metal nanostructures. This technique offers superior stability and versatility for applications in flexible electronics.

Keywords:
multiscalenanofabricationnanotransfer printingnanowire arrayplasmonicstemplate-stripping

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Surface Science

Background:

  • Metal nanostructures are crucial for plasmonic and electronic devices.
  • Current fabrication methods are often limited by area, cost, and harsh conditions.

Purpose of the Study:

  • To introduce a versatile nanotransfer printing method for fabricating metal nanostructures.
  • To overcome limitations of existing methods regarding scale, cost, and processing conditions.

Main Methods:

  • Template-stripping based nanotransfer printing.
  • Transfer of thin film metal structures onto diverse substrates (glass, Kapton, silicon, PDMS).
  • Wafer-scale fabrication from nanometers to hundreds of micrometers.

Main Results:

  • The process is organic solvent-free, multilayer compatible, and rapid (minutes).
  • Transferred gold structures on glass show enhanced stability compared to e-beam evaporation, eliminating the need for adhesion layers.
  • Structures can be transferred onto curved substrates and are compatible with roll-to-roll fabrication.

Conclusions:

  • The developed nanotransfer printing method provides a scalable, cost-effective, and versatile approach for fabricating high-quality metal nanostructures.
  • This technique is suitable for producing superior nanostructures for flexible and stretchable electronics applications.