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Scanning microwave microscopy applied to semiconducting GaAs structures
Arne Buchter1, Johannes Hoffmann1, Alexandra Delvallée2
1Federal Institute of Metrology METAS, Lindenweg 50, 3003 Bern-Wabern, Switzerland.
Abstract:
A calibration algorithm based on one-port vector network analyzer (VNA) calibration for scanning microwave microscopes (SMMs) is presented and used to extract quantitative carrier densities from a semiconducting n-doped GaAs multilayer sample. This robust and versatile algorithm is instrument and frequency independent, as we demonstrate by analyzing experimental data from two different, cantilever- and tuning fork-based, microscope setups operating in a wide frequency range up to 27.5 GHz. To benchmark the SMM results, comparison with secondary ion mass spectrometry is undertaken. Furthermore, we show SMM data on a GaAs p-n junction distinguishing p- and n-doped layers.
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