Toward a Correlative Metrology Approach on the Same 2D Flake: Graphene Oxide Case Study-Sample Preparation and...

Area of Science:

• Materials Science
• Nanotechnology
• Surface Science

Background:

• Graphene production is complex, hindering widespread applications.
• Reduction of graphene oxide (GO) is a common method for graphene synthesis.
• Current characterization lacks a comprehensive methodology for GO reduction monitoring.

Purpose of the Study:

• To propose a correlative metrology strategy for characterizing graphene oxide reduction.
• To provide guidelines for substrate selection and technique-specific precautions.
• To establish a reliable method for monitoring the GO reduction process.

Main Methods:

• Correlative metrology integrating Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), Raman Microscopy/Spectroscopy, Scanning Microwave Microscopy (SMM), and Scanning Thermal Microscopy (SThM).
• Evaluation of substrate suitability, focusing on silicon and silicon dioxide on silicon.
• Analysis of potential sample degradation caused by each microscopy technique.

Main Results:

• Identified silicon and silicon dioxide on silicon as suitable substrates.
• Determined optimal sequence and precautions for applying multiple microscopy techniques to GO flakes.
• Developed a strategy to obtain reliable data for monitoring GO reduction.

Conclusions:

• A comprehensive correlative metrology approach is essential for reliable GO characterization.
• Careful substrate selection and technique sequencing minimize degradation and ensure data integrity.
• The proposed methodology enables effective monitoring of the graphene oxide reduction process.