Toward a Correlative Metrology Approach on the Same 2D Flake: Graphene Oxide Case Study-Sample Preparation and...

Although graphene promises a wide range of applications, large-scale production of this material remains complex. One very common way of obtaining graphene is through a reduction in graphene oxide (GO). In order to fully control this production process, it is necessary to obtain data from different techniques, but a comprehensive characterization methodology and associated metrology are currently lacking. Here, we propose tools for substrate selection (in this study, the most appropriate were silicon and silicon dioxide on silicon) and precautions to be taken when setting up a correlative metrology method integrating atomic force microscopy (AFM), scanning electron microscopy (SEM), Raman microscopy/spectroscopy, scanning microwave microscopy (SMM) and scanning thermal microscopy (SThM). Indeed, in order to obtain reliable data for each of these techniques applied to a unique graphene oxide flake, a strategy must be developed and could be implemented to monitor the reduction in GO. Emphasis was placed on the choice of the substrate and on the possible degradations generated by each of the techniques employed, and a running sequence was determined.