UV/H2O2 process stability and pilot-scale validation for trace organic chemical removal from wastewater treatment
David B Miklos1, Rebecca Hartl1, Philipp Michel1
1Chair of Urban Water Systems Engineering, Technical University of Munich, Am Coulombwall 3, 85748, Garching, Germany.
Abstract:
This study investigated the removal of 15 trace organic chemicals (TOrCs) occurring at ambient concentrations from municipal wastewater treatment plant effluent by advanced oxidation using UV/H2O2 at pilot-scale. Pseudo first-order rate constants (kobs) for photolytic as well as combined oxidative and photolytic degradation observed at pilot-scale were validated with results from a bench-scale collimated beam device. No significant difference was determined between pilot- and lab-scale performance. During continuous pilot-scale operation at constant UV fluence of 800 mJ/cm2 and H2O2 dosage of 10 mg/L, the removal of various TOrCs was investigated. The average observed removal for photo-susceptible (kUV>10-3 cm2/mJ; like diclofenac, iopromide and sulfamethoxazole), moderately photo-susceptible (10-4
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