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Related Experiment Video

Updated: Feb 13, 2026

Graphene-Assisted Quasi-van der Waals Epitaxy of AlN Film on Nano-Patterned Sapphire Substrate for Ultraviolet Light Emitting Diodes

Graphene-Assisted Quasi-van der Waals Epitaxy of AlN Film on Nano-Patterned Sapphire Substrate for Ultraviolet Light Emitting Diodes

Published on: June 25, 2020

NLL-Assisted Multilayer Graphene Patterning.

Evgeniya Kovalska^1,2, Ihor Pavlov¹, Petro Deminskyi¹

¹Laboratory of Smart Materials and Devices, Department of Physics, and Ultrafast Optics and Lasers Laboratory, Department of Physics, Bilkent University, Ankara 06800, Turkey.

|March 6, 2018

Summary

This summary is machine-generated.

Nonlinear laser lithography (NLL) enables cost-effective, high-speed nanofabrication of patterned multilayer graphene (MLG). This technique precisely structures graphene, enhancing its properties for advanced devices like supercapacitors and batteries.

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Synthesis and Functionalization of 3D Nano-graphene Materials: Graphene Aerogels and Graphene Macro Assemblies

Published on: November 5, 2015

Area of Science:

Materials Science
Nanotechnology
Laser Engineering

Background:

Graphene-based devices face limitations due to surface properties and structure.
Laser techniques offer a way to engineer graphene's surface area and transport properties.

Purpose of the Study:

To introduce nonlinear laser lithography (NLL) for patterning multilayer graphene (MLG).
To demonstrate NLL's capability for low-cost, high-speed, and precise graphene nanofabrication.
To explore the tuning of graphene's chemical and electro-optical properties.

Main Methods:

Utilized a high-repetition-rate femtosecond Yb fiber laser for NLL.
Fabricated regularly patterned MLG (p-MLG) on nickel foil via chemical vapor deposition.
Adjusted laser power to tune material properties.

Main Results:

Achieved uniform, periodic nanostructures over large areas (1 cm²/15 s) with NLL.
Demonstrated precise patterning of MLG without fabrication tolerances.
Tuned wettability, transmittance, and sheet resistance of p-MLG through laser power control.

Conclusions:

NLL is a promising technique for multifunctional graphene device engineering.
NLL-assisted graphene patterning shows potential for supercapacitors and Li-ion batteries.
This method opens new avenues in optics, photonics, and bioelectronics.