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Updated: Feb 13, 2026

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
Published on: December 5, 2015
Publisher Correction: Universal strategy for Ohmic hole injection into organic semiconductors with high ionization
Naresh B Kotadiya1, Hao Lu1, Anirban Mondal1
1Max Planck Institute for Polymer Research, Mainz, Germany.
Abstract:
In the html version of this Article originally published, Paul W. M. Blom and Gert-Jan A. H. Wetzelaer were incorrectly listed as Paul M. W. Blom and Gert-Jan H. A. Wetzelaer, respectively, due to a technical error. This has now been amended in all online versions of the Article.
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