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Multi-Mode Elastic Peak Electron Microscopy (MM-EPEM): A new imaging technique with an ultimate in-depth resolution
Mohamed Aymen Mahjoub1, Guillaume Monier1, Luc Bideux1
1Institut Pascal, Université Clermont Auvergne, CNRS, SIGMA, F-63000 Clermont-Ferrand, France.
Abstract:
A non-destructive new imaging technique called Multi-Mode Elastic Peak Electron Microscopy (MM-EPEM), hypersensitive to surface chemistry and with an in-depth resolution of one atomic monolayer was developed. This method consists on performing several MM-EPEM images containing n × n pixels associated to an intensity of the elastic backscattered electrons by varying the incident electron energy in the range 200-2000 eV. This approach allows obtaining depth sampling information of the analyzed structures. Furthermore, MM-EPEM is associated with Monte-Carlo simulations describing the electron pathway in materials in order to obtain very precise quantitative information, for instance the growth mode and the organization of ultra-thin layers (2D materials) or nanoparticules. In this work, we used this new method to study the deposition of very small amount of gold down to one monolayer. Example of 3D reconstruction is also provided.
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