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Metrology of nanoscale grating structures by UV scatterometry
Optics Express
|March 10, 2018
Summary
Goniometric scatterometry precisely reconstructs 25 nm grating profiles on silicon wafers. This advanced technique offers accurate cross-section analysis, validated by scanning electron microscopy (SEM).
Area of Science:
- Optics and Photonics
- Materials Science
- Nanotechnology
Background:
- Gratings are crucial optical components.
- Characterizing nanoscale gratings requires high precision.
- Existing methods have limitations in profile reconstruction.
Purpose of the Study:
- To demonstrate goniometric scatterometry for nanoscale grating analysis.
- To reconstruct the complete cross-section profile of gratings.
- To introduce and validate a novel geometry parameterization.
Main Methods:
- Goniometric scatterometry measurements at 266 nm wavelength.
- Measurements performed in four configurations with parallel data evaluation.
- Novel geometry parameterization and co-variance analysis.
Main Results:
- Accurate reconstruction of grating cross-section profiles down to 25 nm linewidth.
- Demonstration of a new parameterization overcoming previous limitations.
- Excellent qualitative agreement with cross-section scanning electron microscope (SEM) images.
Conclusions:
- Goniometric scatterometry is effective for nanoscale grating characterization.
- The novel parameterization enhances the reliability of profile reconstruction.
- The method provides a valuable, non-destructive alternative to SEM for grating analysis.
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