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Updated: Feb 12, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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Design for an aberration corrected scanning electron microscope using miniature electron mirrors.

Hideto Dohi1, Pieter Kruit2

  • 1Faculty of Applied Sciences, Delft University of Technology, Lorentzweg 1, 2628 CJ, Delft, The Netherlands; Hitachi High-Technologies Corporation, 882, Ichige, Hitachinaka, Ibaraki, 312-8504, Japan.

Ultramicroscopy
|March 26, 2018
PubMed
Summary

A novel mirror corrector using micro-scale elements offers simple, low-cost aberration correction for scanning electron microscopes (SEMs). This design minimizes deflection aberrations, enhancing SEM resolution.

Keywords:
Aberration correctorElectron mirrorMEMS electron opticsScanning electron microscope

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Area of Science:

  • Electron Optics
  • Microscopy Technology
  • MEMS (Micro-Electro-Mechanical Systems)

Background:

  • Scanning electron microscope (SEM) resolution is limited by objective lens aberrations, primarily spherical and chromatic.
  • Existing aberration correctors using bending magnets and electron mirrors are complex and can introduce their own aberrations.
  • The practical implementation of aberration correction in SEMs has been hindered by these challenges.

Purpose of the Study:

  • To propose a novel, simplified aberration corrector system for SEMs.
  • To investigate the feasibility of using micro-scale electron optical elements for aberration correction.
  • To demonstrate a design that minimizes deflection aberrations and allows for precise correction.

Main Methods:

  • A new mirror corrector design featuring two perpendicular micro-mirrors is proposed.
  • The system utilizes small-angle magnetic deflection (approx. 50 mrad) to guide the electron beam.
  • Optical calculations, including numerical analysis of micro-mirror aberrations and analytical modeling of deflector dispersion, were performed.

Main Results:

  • The proposed mirror corrector design effectively minimizes deflection aberrations.
  • Symmetric deflection fields prevent lateral dispersion at the sample plane.
  • Micro-scale elements fabricated with MEMS technology enable the necessary precision and proximity for the corrector.
  • Variable magnification via a transfer lens allows for precise tuning of spherical and chromatic aberration correction.

Conclusions:

  • The proposed micro-mirror aberration corrector system is a promising solution for SEMs.
  • It offers a simple and potentially low-cost method for aberration correction, particularly for low-voltage SEMs.
  • This technology has the potential to significantly improve SEM resolution and performance.