Gate-Induced Metal-Insulator Transition in MoS2 by Solid Superionic Conductor LaF3

Chun-Lan Wu1, Hongtao Yuan1,2,3, Yanbin Li1

  • 1Department of Material Science and Engineering , Stanford University , Stanford , California 94305 , United States.

Nano Letters
|March 28, 2018
PubMed
Summary

This study introduces a solid-state electric-double-layer (EDL) device using LaF3 for tunable carrier density. This approach overcomes limitations of liquid electrolytes, enabling advanced interfacial electronic studies with higher mobility in MoS2 transistors.

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