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Imperfections in Crystal Structure: Stoichiometric Point Defects

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Defect-Engineered Scaling of Lead-Free Ferroelectrics with Ultra-Low-Voltage Switching.

Reza Ghanbari1, Jiayue Wang2,3, Harikrishnan Kp4

  • 1Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27606, United States.

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|July 10, 2026
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Summary

Defect engineering enables ultrathin, lead-free ferroelectrics for low-power electronics. Modulating alkali deficiency suppresses leakage, allowing robust operation below 10 nanometers and 100 millivolts.

Keywords:
deep trap statesnanoscale defect complexesultra-low-voltage switchingultrathin ferroelectric films

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Area of Science:

  • Materials Science
  • Condensed Matter Physics
  • Electronics Engineering

Background:

  • Scaling ferroelectric materials to nanometer thicknesses is crucial for low-power, nonvolatile electronics.
  • Leakage currents become a significant issue in reduced dimensions, limiting device performance.
  • Alkali-based, lead-free ferroelectrics are environmentally sustainable but face scaling challenges due to volatile alkali constituents causing leakage.

Purpose of the Study:

  • To overcome the leakage limitations in ultrathin alkali-based, lead-free ferroelectrics.
  • To demonstrate a method for enabling robust ferroelectric operation at the nanoscale.
  • To explore defect engineering as a strategy for advancing environmentally benign ferroelectric technologies.

Main Methods:

  • Thin-film synthesis with precise modulation of alkali deficiency.
  • Engineering clustered defect complexes to act as deep trap states.
  • Characterization of ferroelectric properties in sub-10 nm films.

Main Results:

  • Successfully suppressed leakage currents in ultrathin ferroelectric films.
  • Achieved robust ferroelectric operation down to the sub-10 nm regime.
  • Demonstrated operation at voltages below 100 mV through defect engineering.

Conclusions:

  • Defect engineering can transform intrinsic limitations into advantageous properties for ferroelectric scaling.
  • This approach enables the development of ultra-low-power, nonvolatile electronic devices using environmentally benign ferroelectrics.
  • The findings pave the way for advancing next-generation electronic technologies.