Spatial Control of Photoacid Diffusion in Chemically Amplified Resist (CAR) via External Electric Field

We investigated the effect of an electric field-based post exposure bake (EF-PEB) process on photoacid diffusion and pattern formation. To investigate the control of photoacid diffusion experimentally, the EF-PEB processes was performed at various temperatures. Cross sectional images of various EF-PEB processed samples were obtained by scanning electron microscopy (SEM) after ion beam milling. In addition, we conducted a numerical analysis of photoacid distribution and diffusion with following Fick's second law and compared the experimental results with our theoretical model. The drift distance was theoretically predicted by multiplying drift velocity and EF-PEB time, and the experimental values were obtained by finding the difference in pattern depths of PEB/EFPEB samples. Finally, an EF-PEB temperature of 85 °C was confirmed as the optimum condition to maximize photoacid drift distance using the electric field.