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Production of Single Tracks of Ti-6Al-4V by Directed Energy Deposition to Determine the Layer Thickness for Multilayer Deposition
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Thickness-dependent structural characteristics for a sputtering-deposited chromium monolayer and Cr/C and Cr/Sc

Hui Jiang1, Hua Wang1, Jingtao Zhu2

  • 1Shanghai Synchrotron Radiation Facility, Shanghai Institute of Applied Physics, Chinese Academy of Sciences, 239 Zhangheng Road, Pudong District, Shanghai 201204, People's Republic of China.

Journal of Synchrotron Radiation
|May 2, 2018
PubMed

Keywords:
X-ray multilayerchromiumgrowthinterfaceligand

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