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Polymer/silica hybrid integration add-drop filter based on grating-assisted contradirectional coupler.

Liang Tian, Fei Wang, Yuanda Wu

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    A novel polymer/silica hybrid add-drop filter was fabricated using cost-effective contact lithography. This grating-assisted device demonstrates efficient light filtering with a 13 dB extinction ratio and a narrow 0.6 nm bandwidth.

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    Area of Science:

    • Photonics
    • Materials Science
    • Optical Engineering

    Background:

    • Add-drop filters are crucial components in optical communication networks.
    • Existing fabrication methods can be complex and expensive.
    • Hybrid polymer/silica platforms offer potential for integrated photonic devices.

    Purpose of the Study:

    • To propose and demonstrate a polymer/silica hybrid integration add-drop filter.
    • To utilize simple and low-cost contact lithography for fabrication.
    • To characterize the optical performance and thermal stability of the device.

    Main Methods:

    • Fabrication involved contact lithography and inductively coupled plasma (ICP) etching for silica structures.
    • An SU-8 polymer film was spin-coated to form an inverted-rib waveguide.
    • The slab layer was removed using ICP etching.

    Main Results:

    • The filter exhibited a rejection band with a 13 dB extinction ratio and 0.6 nm 3 dB bandwidth.
    • A passband with a 12 dB side-mode suppression ratio and 0.5 nm 3 dB bandwidth was observed.
    • The device showed a temperature dependence of approximately 4.8 nm over 25-55°C, with a slope of -0.16 nm/°C.

    Conclusions:

    • The proposed grating-assisted contradirectional coupler is a viable approach for fabricating efficient add-drop filters.
    • Contact lithography offers a low-cost and simple fabrication route.
    • The hybrid device demonstrates good optical performance and predictable thermal behavior.