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Void Formation/Elimination and Viscoelastic Response of Polyphenylsilsesquioxane Monolith

Yusuke Daiko1, Yuki Oda2, Sawao Honda3

  • 1Department of Life Science and Applied Chemistry, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya, Aichi 466-8555, Japan. daiko.yusuke@nitech.ac.jp.

Materials (Basel, Switzerland)
|May 23, 2018
PubMed

Keywords:
breakdown voltagepower modulesilsesquioxaneviscoelasticityvoid

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