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Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
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Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review

Abid Iqbal1, Faisal Mohd-Yasin2

  • 1Queensland Micro- and Nanotechnology Centre, Griffith University, Nathan, QLD 4111, Australia. abid.iqbal@griffithuni.edu.au.

Sensors (Basel, Switzerland)
|June 6, 2018
PubMed

Keywords:
aluminum nitrideenergy harvesterphysical vapor depositionpiezoelectricsputtering

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