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Updated: Feb 9, 2026

Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
Published on: September 28, 2019
Structural and morphological data of RF-Sputtered BiVO4 thin films
R Venkatesan1,2, S Velumani1, K Ordon2,3
1Department of Electrical Engineering (SEES), CINVESTAV-IPN, Zacatenco, Av IPN #2508, Col Zacatenco, D.F. C.P. 07360, Mexico.
Abstract:
Structural and morphological modulation of rf-sputtered BiVO4 thin films deposited using mechanochemical synthesis prepared BiVO4 nano-powders as sintered target are included in this data article. The crystalline nature of as-prepared films, namely amorphous and crystalline was acquired with time and temperature dependent in-situ high temperature X-ray diffraction (HT-XRD), at a time interval of 1 h. Typical Fourier transform infrared (FT-IR) spectra of annealed thin film of monoclinic BiVO4 structure is given. Furthermore, correlation between morphologies of various substrate temperature fabricated BiVO4 thin films are presented.
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