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Controlled, Low-Temperature Nanogap Propagation in Graphene Using Femtosecond Laser Patterning
Ange Maurice1,2, Laurence Bodelot3, Beng Kang Tay1,2
1NOVITAS, Nanoelectronics Center of Excellence, School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore, 639798, Singapore.
Controlled graphene nanogap formation using femtosecond lasers enables precise fabrication for nanoelectronics. This cold electroburning process prevents thermal damage, crucial for advanced graphene circuit development.
Area of Science:
- Materials Science
- Nanotechnology
- Condensed Matter Physics
Background:
- Graphene nanogap systems are vital for molecular electronics, memories, and nanodevices.
- Precise control over nanogap formation is essential for reliable device fabrication.
Purpose of the Study:
- To demonstrate a method for controlling nanogap propagation in monolayer graphene during electroburning.
- To establish a reliable and low-temperature fabrication process for graphene nanodevices.
Main Methods:
- Inducing defects in graphene using a patterned, tightly focused femtosecond laser beam.
- Utilizing passive voltage contrast and atomic force microscopy to confirm nanogap propagation and reproducibility.
- Employing in situ infrared thermography and finite element analysis for real-time temperature estimation.
Main Results:
- Femtosecond laser-patterned defects guide nanogap propagation, unlike in pristine graphene.
- The process demonstrates high reproducibility with a 92% success rate across 26 devices.
- Controlled nanogap formation occurs below 50 °C at high defect densities.
Conclusions:
- Femtosecond laser patterning offers precise control over graphene nanogap formation.
- The demonstrated cold electroburning process is critical for fabricating complex graphene circuits without thermal damage.
- This technique advances the potential for scalable graphene-based electronic device manufacturing.
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