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Dislocation driven spiral and non-spiral growth in layered chalcogenides
Yifan Nie1, Adam T Barton, Rafik Addou
1Department of Materials Science and Engineering, The University of Texas at Dallas, Richardson, Texas 75080, USA. kjcho@utdallas.edu.
Controlling film thickness in 2D material epitaxy is crucial for devices. This study reveals multilayer growth mechanisms, identifying conditions for precise layer-by-layer growth.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Surface Science
Background:
- Two-dimensional (2D) materials offer potential for advanced electronic and photonic devices.
- Precise control over film thickness during epitaxial growth is a significant challenge for industrial applications.
- Uncontrolled multilayer growth disrupts theoretical expectations and breaks crystal inversion symmetry.
Purpose of the Study:
- To elucidate the underlying mechanism of unconventional multilayer growth in the epitaxy of layered materials.
- To identify the specific conditions that promote non-ideal growth modes.
- To provide guidelines for achieving controlled layer-by-layer growth.
Main Methods:
- Multiscale theoretical investigation combined with experimental evidence.
- Analysis of mechanistic similarities between multilayer concentric and spiral growth.
- Experimental demonstration and simulations to study driving forces and defect formation.
Main Results:
- Multilayer growth is driven by both chalcogen deficiency (leading to metal clustering) and excess (creating step edges).
- Identified specific nucleation defects and in-domain step edges contributing to multilayer formation.
- Revealed mechanistic parallels between different non-ideal growth modes.
Conclusions:
- Understanding the roles of chalcogen stoichiometry is key to controlling 2D material epitaxy.
- Findings offer practical guidelines for optimizing growth conditions.
- Enables large-area, layer-by-layer growth for next-generation device fabrication.
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