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Patent Review on Laser Interference Lithography Technique for Producing Periodic Nanostructure
Chia-Wei Jui1, Amy J C Trappey2, Chien-Chung Fu1
1Institute of NanoEngineering and MicroSystems, National Tsing Hua University, Hsinchu City, Taiwan.
Recent Patents on Nanotechnology
|August 8, 2018
Summary
Mask-less laser interference lithography (LIL) offers a cost-effective solution for semiconductor manufacturing. This technique is crucial for achieving high-precision nanoscale patterns, particularly in emerging bionanotechnology applications.
Area of Science:
- Nanotechnology
- Semiconductor Manufacturing
- Optical Lithography
Background:
- Semiconductor industry faces increasing cost pressures as feature sizes approach atomic scale.
- Traditional lithography equipment is prohibitively expensive.
- Mask-less Laser Interference Lithography (LIL) presents a cost-effective alternative.
Purpose of the Study:
- To review patents related to Mask-less Laser Interference Lithography (LIL).
- To analyze the technical features and configurations of LIL patents.
- To identify trends in LIL technology development.
Main Methods:
- Patent retrieval using keywords based on LIL technical features and experimental configurations.
- Application of Boolean logic operators for patent set relationships.
- Identification of common patent classification codes and definitions.
Main Results:
- LIL patents are categorized into optical methods and lithographic equipment.
- Beam splitter configurations dominate optical method patents.
- System planning techniques are most prevalent in lithographic equipment patents.
Conclusions:
- Improving LIL precision is vital to prevent defocusing for high-density line widths.
- LIL is highly suitable for micro/nanofluidic devices in bionanotechnology.
- The mask-less, periodic nanoscale pattern generation capability of LIL is valuable for periodicity-related fields.
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