TiN Films Deposited on Uranium by High Power Pulsed Magnetron Sputtering under Low Temperature.
Jingjing Ding1, Xixi Yin2, Liping Fang3
1Institute of Material, China Academy of Engineering Physics, Mianyang 621900, China. dingjingjing21@126.com.
Materials (Basel, Switzerland)
|August 15, 2018
Summary
High power pulsed magnetron sputtering (HPPMS) enhanced titanium nitride (TiN) films on depleted uranium (DU) offer superior protection. These HPPMS-deposited TiN films exhibit improved mechanical properties, wear resistance, and corrosion resistance compared to DCMS methods.
Area of Science:
- Materials Science
- Surface Engineering
- Nuclear Engineering
Background:
- Depleted uranium (DU) readily oxidizes, limiting its use in the nuclear industry.
- Titanium nitride (TiN) films offer excellent mechanical and corrosion resistance.
- Protective coatings are crucial for enhancing the stability and application of DU.
Purpose of the Study:
- To compare the effectiveness of TiN films deposited by direct current magnetron sputtering (DCMS) and high power pulsed magnetron sputtering (HPPMS) for protecting DU.
- To investigate the influence of deposition method on the microstructure, mechanical properties, wear behavior, adhesion, and corrosion resistance of TiN films on DU.
- To evaluate the role of a Ti interlayer deposited by HPPMS in enhancing film properties.
Main Methods:
- Deposition of TiN films on DU using DCMS and HPPMS techniques.
- Characterization of surface morphology and microstructure via AFM, SEM, and GIXRD.
- Evaluation of mechanical properties (hardness, Young's modulus) using nano-indentation.
- Analysis of wear behavior and adhesion through pin-on-disc and scratch tests.
- Assessment of corrosion resistance using electrochemical measurements.
Main Results:
- HPPMS-deposited TiN films demonstrated superior performance over DCMS-deposited films.
- Improvements were observed in surface roughness, mechanical properties, wear resistance, adhesion, and corrosion resistance with HPPMS.
- The enhanced properties are attributed to the denser columnar grain structure and preferred (111) plane orientation in HPPMS films.
- A Ti interlayer deposited by HPPMS further enhanced film properties compared to DCMS, due to increased ion bombardment.
Conclusions:
- HPPMS is a more effective method than DCMS for depositing protective TiN films on depleted uranium.
- The optimized microstructure and properties of HPPMS-deposited TiN films significantly improve DU's resistance to oxidation and degradation.
- The findings suggest HPPMS-based TiN coatings are a promising solution for extending the applications of depleted uranium.
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