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Grating-assisted-cylindrical-resonant-cavities interlayer coupler.

Congshan Wan, Thomas K Gaylord, Muhannad S Bakir

    Applied Optics
    |August 18, 2018
    PubMed
    Summary

    A novel grating-assisted cylindrical resonant cavities (GARC) interlayer coupler offers efficient and broadband coupling. This silicon/silicon dioxide device surpasses conventional designs in performance and fabrication tolerance.

    Area of Science:

    • Optoelectronics
    • Nanophotonics
    • Integrated Photonics

    Background:

    • Efficient interlayer coupling is crucial for advanced integrated photonic circuits.
    • Existing couplers often face limitations in bandwidth, efficiency, and fabrication tolerance.
    • Silicon/silicon dioxide (Si/SiO2) platform offers a robust foundation for photonic devices.

    Purpose of the Study:

    • To design and simulate a novel grating-assisted cylindrical resonant cavities (GARC) interlayer coupler.
    • To achieve efficient and broadband interlayer coupling using Si/SiO2.
    • To evaluate the performance and fabrication tolerance of the proposed GARC coupler.

    Main Methods:

    • Design of a GARC coupler comprising three cylindrical resonant cavities (two horizontal waveguide, one vertical via).

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  • Enhancement of resonant strengths using circular Bessel-function-defined gratings and distributed Bragg reflectors.
  • Simulation of coupling efficiency, bandwidth, and tolerance to misalignment for transverse electric polarization at 1.55 μm wavelength.

    • Main Results:

    • Simulated interlayer coupling efficiency of 68% (-1.7 dB) for transverse electric polarization at 1.55 μm.
    • Achieved a wide operational bandwidth of 270 nm (1 dB bandwidth).
    • Demonstrated superior performance compared to conventional rectangular silicon-on-insulator gratings.

    Conclusions:

    • The GARC coupler exhibits high efficiency and broadband operation, exceeding conventional designs.
    • The coupler offers significant advantages in fabrication tolerance, footprint, and interlayer distance flexibility.
    • Vertical dimension control is critical during fabrication, while horizontal dimensions are less sensitive.