Al/Si Nanopillars as Very Sensitive SERS Substrates

In this paper, we present a fast fabrication of Al/Si nanopillars for an ultrasensitive SERS detection of chemical molecules. The fabrication process is only composed of two steps: use of a native oxide layer as a physical etch mask followed by evaporation of an aluminum layer. A random arrangement of well-defined Al/Si nanopillars is obtained on a large-area wafer of Si. A good uniformity of SERS signal is achieved on the whole wafer. Finally, we investigated experimentally the sensitivity of these Al/Si nanopillars for SERS sensing, and analytical enhancement factors in the range of 1.5 × 10 7 - 2.5 × 10 7 were found for the detection of thiophenol molecules. Additionally, 3D FDTD simulations were used to better understand optical properties of Al/Si nanopillars as well as the Raman enhancement.