Plasmonic nano-printing: large-area nanoscale energy deposition for efficient surface texturing
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Updated: Feb 5, 2026

Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition
Published on: February 27, 2013
Lei Wang1, Qi-Dai Chen1, Xiao-Wen Cao1
1State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, 2699 Qianjin Street, Changchun 130012, China.
Abstract:
The lossy nature of plasmonic wave due to absorption is shown to become an advantage for scaling-up a large area surface nanotexturing of transparent dielectrics and semiconductors by a self-organized sub-wavelength energy deposition leading to an ablation pattern-ripples-using this plasmonic nano-printing. Irreversible nanoscale modifications are delivered by surface plasmon polariton (SPP) using: (i) fast scan and (ii) cylindrical focusing of femtosecond laser pulses for a high patterning throughput. The mechanism of ripple formation on ZnS dielectric is experimentally proven to occur via surface wave at the substrate-plasma interface. The line focusing increase the ordering quality of ripples and facilitates fabrication over wafer-sized areas within a practical time span. Nanoprinting using SPP is expected to open new applications in photo-catalysis, tribology, and solar light harvesting via localized energy deposition rather scattering used in photonic and sensing applications based on re-scattering of SPP modes into far-field modes.
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