Interferometric scattering for optical tomoslicing of transparent solids

Area of Science:

• Optics and Photonics
• Materials Science
• Manufacturing Technologies

Background:

• Light scattering is typically detrimental in laser-material processing.
• Achieving high axial resolution in optical manufacturing has been a long-standing challenge.

Purpose of the Study:

• To overturn the conventional view of light scattering in laser-material processing.
• To achieve sub-10 nm axial resolution in optical manufacturing.

Main Methods:

• Developed an interferometric scattering effect.
• Utilized controlled sequential generation of nano-scatterers via laser interference.
• Implemented interferometric scattering-based optical tomoslicing technology (i-SOT).

Main Results:

• Achieved sub-10 nm axial resolution, a significant improvement from micrometers.
• Demonstrated i-SOT with kerf widths as narrow as 7 nm.
• Attained industrial standard efficiency of up to 400 mm²/s.

Conclusions:

• The interferometric scattering effect enables unprecedented axial resolution in optical manufacturing.
• Nearly lossless laser wafering (mass loss <1%) is now possible.
• This technology has transformative potential for laser crystals, photovoltaics, and microelectronics manufacturing.