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    This study presents a novel quantitative wavefront measurement technique using a Hartmann mask. The method accurately reconstructs optical wavefronts, proving effective for characterizing laser systems.

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    Area of Science:

    • Optical physics
    • Metrology
    • Laser diagnostics

    Background:

    • Accurate wavefront measurement is crucial for optical system characterization.
    • Existing methods may have limitations regarding imaging system collimation.

    Purpose of the Study:

    • To demonstrate a quantitative wavefront measurement technique using a Hartmann mask.
    • To achieve wavefront measurement independent of imaging system collimation.
    • To enhance measurement accuracy through apodization.

    Main Methods:

    • Utilizing a Hartmann mask re-imaged onto a camera.
    • Reconstructing the wavefront via standard algorithms applied to beamlet centroid differences.
    • Employing apodization with spatially dithered pixel distributions to reduce spatial-frequency content.

    Main Results:

    • Quantitative wavefront measurements were successfully demonstrated.
    • The technique proved independent of imaging system collimation.
    • Apodization significantly improved measurement accuracy.

    Conclusions:

    • The developed Hartmann mask diagnostic offers excellent accuracy over a wide parameter range.
    • This method is suitable for characterizing laser systems.
    • The technique provides a robust approach to optical wavefront metrology.