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A water-processable cellulose-based resist for advanced nanofabrication.

Camilla Dore1, Johann Osmond, Agustín Mihi

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Hydroxypropyl cellulose (HPC) offers an eco-friendly solution for nanoimprinting lithography. This biocompatible resist enables mass production of submicrometric photonic structures using water-based processes.

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Biomaterials

Background:

  • Nanoimprinting lithography (NIL) offers high resolution for submicrometric feature fabrication.
  • Current NIL processes often lack eco-friendly and cost-efficient resist materials.
  • A need exists for sustainable resists compatible with roll-to-roll manufacturing.

Purpose of the Study:

  • To evaluate hydroxypropyl cellulose (HPC) as a green resist for temperature-assisted nanoimprint lithography (tNIL).
  • To demonstrate the fabrication of photonic architectures using HPC.
  • To explore advanced nanofabrication possibilities with HPC-based stacks.

Main Methods:

  • Utilized hydroxypropyl cellulose (HPC) as a resist material.
  • Employed temperature-assisted nanoimprint lithography (tNIL) with elastomeric stamps.
  • Integrated HPC with traditional nanofabrication techniques like spincasting, reactive ion etching, and metal lift-off.

Main Results:

  • Successfully patterned submicrometric features with aspect ratios > 1 using HPC.
  • Fabricated silicon photonic crystals and metal nanoparticle arrays.
  • Demonstrated selective removal of materials in poly(methyl methacrylate)/HPC stacks for complex structures.

Conclusions:

  • HPC is a viable, eco-friendly resist for tNIL, enabling cost-efficient mass production.
  • HPC facilitates the creation of diverse photonic and nanostructured devices.
  • Combining HPC with other resists opens new avenues for advanced, encapsulated nanofabrication.