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Updated: Feb 3, 2026

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A quick convergent-beam laboratory X-ray reflectometer using a simultaneous multiple-angle dispersive geometry.

Wolfgang Voegeli1, Chika Kamezawa1,2, Etsuo Arakawa1

  • 1Department of Physics, Tokyo Gakugei University, 4-1-1 Nukuikita-machi, Koganei, Tokyo 184-8501, Japan.

Journal of Applied Crystallography
|October 16, 2018
PubMed
Summary

This study introduces a novel X-ray reflectometer for rapid thin film analysis. The instrument accurately measures specular X-ray reflectivity curves, enabling precise characterization of material surfaces.

Keywords:
characteristic X-rayslaboratory X-ray sourcesspecular X-ray reflectivitytime-resolved measurement

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Area of Science:

  • Materials Science
  • Surface Science
  • Analytical Chemistry

Background:

  • Accurate characterization of thin films and surfaces is crucial for materials development.
  • Traditional X-ray reflectivity methods can be time-consuming and limited by diffuse scattering.
  • Need for rapid, sensitive techniques for analyzing material interfaces.

Purpose of the Study:

  • To present a novel laboratory X-ray reflectometer for quick specular X-ray reflectivity measurements.
  • To demonstrate the instrument's capability for accurate measurement of low reflectivities.
  • To showcase time-resolved reflectivity measurements.

Main Methods:

  • Utilized a bent-twisted crystal to monochromatize and focus diverging X-rays (Cu Kα1) from a laboratory point source.
  • Employed a two-dimensional detector to record reflected X-rays.
  • Developed a method to separate specularly reflected X-rays from diffuse scattering background without instrument rotation.

Main Results:

  • Achieved reflectivity measurements down to 10⁻⁶ for a gold thin film on silicon within 100 seconds.
  • Demonstrated accurate measurement of low reflectivities (down to 10⁻⁵ in 10 seconds).
  • Successfully measured reflectivity curves for silicon wafers, liquid ethylene glycol, and performed time-resolved measurements on a TiO₂ surface during UV irradiation.

Conclusions:

  • The developed X-ray reflectometer offers a fast and accurate method for specular reflectivity analysis.
  • The instrument's ability to suppress diffuse scattering enables precise measurements of low reflectivities.
  • The system is suitable for various applications, including thin film characterization and in-situ surface studies.