Continuous Near-Field Electrospraying Using a Glass Capillary Nozzle
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Updated: Feb 3, 2026

Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films
Published on: August 19, 2016
Xiang Wang1, Jinghua Lin2, Jiaxin Jiang3,4,5
1School of Mechanical and Automotive Engineering, Xiamen University of Technology, Xiamen 361024, China. wx@xmut.edu.cn.
Abstract:
A continuous near-field electrospray process has been developed to deposit micropatterns. Different from traditional electrospray technologies, the nozzle-to-substrate distance was shortened to less than 5 mm, and a glass capillary nozzle with a diameter of tens of microns was used. Steady and continuous ejection was achieved, and patterns with line widths of sub-100 μm were generated. The influence of experimental parameters was investigated. The critical voltage for electrospray increased with nozzle-to-substrate distance and flow rate. The line width of electrosprayed patterns increased with the increases in applied voltage, flow rate, nozzle diameter, and deposition time. This work provides a simple and potential route for on-demand deposition of micro-/nano-patterns in the electrospray process.
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