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Updated: Feb 3, 2026

High-resolution Patterning Using Two Modes of Electrohydrodynamic Jet: Drop on Demand and Near-field Electrospinning
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Jet outflow and open field line measurements on the C-2W advanced beam-driven field-reversed configuration plasma

D Sheftman1, L Schmitz1, D Gupta1

  • 1TAE Technologies, Inc., P.O. Box 7010, Rancho Santa Margarita, California 92688-7010, USA.

The Review of Scientific Instruments
|November 8, 2018
PubMed

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