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Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
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Indium-Zinc-Tin-Oxide Film Prepared by Reactive Magnetron Sputtering for Electrochromic Applications

Ke-Ding Li1, Po-Wen Chen2, Kao-Shuo Chang3

  • 1Department of Materials Science and Engineering, National Cheng Kung University, Tainan 70101, Taiwan. tyty01068@gmail.com.

Materials (Basel, Switzerland)
|November 11, 2018
PubMed

Keywords:
DC reactive magnetron sputteringcathodic arc plasma (CAP)electrochromic device (ECD)indium-zinc-tin-oxide (IZTO) filmtungsten electrode film

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