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Updated: Feb 2, 2026

Development of Whispering Gallery Mode Polymeric Micro-optical Electric Field Sensors
Published on: January 29, 2013
Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process
Yen-Nan Lin1, Ching-Liang Dai2
1Department of Mechanical Engineering, National Chung Hsing University, Taichung 402, Taiwan. g102061073@mail.nchu.edu.tw.
Abstract:
Micro magnetic field (MMF) sensors developed employing complementary metal oxide semiconductor (CMOS) technology are investigated. The MMF sensors, which are a three-axis sensing type, include a magnetotransistor and four Hall elements. The magnetotransistor is utilized to detect the magnetic field (MF) in the x-axis and y-axis, and four Hall elements are used to sense MF in the z-axis. In addition to emitter, bases and collectors, additional collectors are added to the magnetotransistor. The additional collectors enhance bias current and carrier number, so that the sensor sensitivity is enlarged. The MMF sensor fabrication is easy because it does not require post-CMOS processing. Experiments depict that the MMF sensor sensitivity is 0.69 V/T in the x-axis MF and its sensitivity is 0.55 V/T in the y-axis MF.
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