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Updated: Feb 2, 2026

Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model
Published on: May 23, 2018
Analysis of Optical Plasma Monitoring in Plasma-Enhanced Atomic Layer Deposition Process of Al₂O₃
Muhammad Zeeshan Arshad1, Hyun Woo Tak1, Hyun Gi Kim2
1Department of Electronics Engineering, Myongji University, Yongin, 17058, South-Korea.
Abstract:
A noninvasive, optical plasma monitoring method in plasma-enhanced atomic layer deposition (PEALD) process for nanoscale water vapor barrier film is presented. Any equipment malfunction, as well as a deviation in the condition of individual components can easily jeopardize the process result. Al₂O₃ deposition process was employed in this research as a test vehicle, and high-speed optical plasma monitoring was demonstrated. It is shown that optical plasma monitoring is useful for not only measuring plasma pulses in real time, but also for the detection of any variation in plasma condition which enables inferring plasma dynamics for advanced process control in nanoscale thin film deposition process.
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