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Integrated optical frequency domain reflectometry device for characterization of complex integrated devices
Optics Express
|November 25, 2018
Summary
We developed an integrated optical frequency domain reflectometry (OFDR) device for precise photonic integrated circuit measurements. This compact system enhances performance for characterizing fabrication deviations in advanced optical devices.
Area of Science:
- Photonics
- Integrated Optics
- Optical Metrology
Background:
- Advanced measurement systems are crucial for modern photonic integrated circuits.
- Optical frequency domain reflectometry (OFDR) offers robust characterization of design-to-fabrication deviations.
- Existing methods may lack compactness or integrated functionality.
Purpose of the Study:
- To report a novel OFDR device with monolithic integration of the interferometric component and the device under test.
- To highlight the advantages of this integrated approach, including improved compactness and performance.
- To emphasize the significance of an incorporated dispersion de-embedding mechanism.
Main Methods:
- Monolithic integration of the OFDR interferometric system with the device under test.
- Development and implementation of a dispersion de-embedding mechanism.
- Experimental validation using an arrayed waveguide grating on a silicon nitride platform.
Main Results:
- Demonstration of a compact and high-performance integrated OFDR device.
- Successful characterization of design-to-fabrication deviations in an arrayed waveguide grating.
- Validation of the dispersion de-embedding mechanism's effectiveness.
Conclusions:
- The proposed integrated OFDR device represents a significant advancement in testing photonic integrated circuits.
- This work is a foundational step towards a universal test structure for integrated optical devices.
- The integrated approach offers a promising solution for efficient and accurate characterization in photonic manufacturing.
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