Related Experiment Video
Updated: Feb 2, 2026

Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
Published on: September 28, 2019
Effect of Substrate Temperature on the Properties of Eu-Doped SrSnO₃ Phosphor Thin Films Grown by Sputtering
1Division of Materials Science and Engineering, Silla University, Busan 46958, Korea.
Abstract:
Eu3+-doped SrSnO₃ (SrSnO₃:Eu3+) phosphor thin films are deposited on sapphire substrates by radio-frequency magnetron sputtering. The substrate temperature is varied from 25 to 400 °C. All SrSnO₃:Eu3+ films show amorphous behavior, while the band gap energies decrease with an increase in the substrate temperature and are determined to be 4.16-4.26 eV. The optical transmittance spectra exhibit an average transmittance of approximately 91% in the wavelength range 500-1100 nm; a gradual increase in emission intensity arising from the 5D0→7F₂ transition (618 nm) of Eu3+ is observed with increasing substrate temperature. These results suggest that the optimum substrate temperature for depositing SrSnO₃:Eu3+ red-emitting phosphor thin films is 400 °C.
More Related Videos
11:07Synthesis of Non-uniformly Pr-doped SrTiO3 Ceramics and Their Thermoelectric Properties
Published on: August 15, 2015
06:49Radio Frequency Magnetron Sputtering of GdBa2Cu3O7âˆ'ÃŽ ´/ La0.67Sr0.33MnO3 Quasi-bilayer Films on SrTiO3 STO Single-crystal Substrates
Published on: April 12, 2019
Related Concept Videos
Physical and Chemical Properties of Matter
Properties of Transition Metals
Body Temperature
Body Temperature
The average body temperature is approximately 37°C (98.6°F) and typically ranges from 36.1–37.2°C...
Effects of Temperature on Free Energy
General Properties of Solutions