Boosting contact sliding and wear protection via atomic intermixing and tailoring of nanoscale interfaces

Neeraj Dwivedi1, Reuben J Yeo1,2, Chetna Dhand3

  • 1Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117583, Republic of Singapore.

Science Advances
|February 13, 2019
PubMed

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