Related Experiment Video
Updated: Jan 29, 2026

Writing and Low-Temperature Characterization of Oxide Nanostructures
Published on: July 18, 2014
Large area patterning of residue-free metal oxide nanostructures by liquid transfer imprint lithography
Suok Lee1, Sang Hee Jung2, A-Rang Jang3
1Advanced Nano-Surface Group, Korea Basic Science Institute (KBSI), 169-148 Gwahak-ro, Yuseong-gu, Daejeon 34133, Republic of Korea.
Abstract:
One-dimensional (1D) and three-dimensional (3D) residue-free metal oxide patterns are directly fabricated over large areas using liquid transfer imprint lithography (LTIL) with an ultraviolet-curable metal oxide precursor resist. A 1D line or pillar array of metal oxides nano-patterns without a residual layer is formed by LTIL and annealing processes. A 3D layer-by-layer nanomesh structure is successfully constructed by repeating the LTIL method without a complex etching process. In addition, it is possible to form a hierarchical structure in which zinc oxide nanowires are selectively grown on a desired zinc oxide (ZnO) seed pattern formed by LTIL via a hydrothermal method. Unlike the pattern fabricated by the conventional nanoimprint lithography method, in the case of the pattern formed by LTIL the residues accumulated between the patterns during the patterning procedure can be removed, and thus it is possible to easily form various types of nanostructures.
Related Concept Videos
Imprinting
Genomic Imprinting and Inheritance
The expression of some genes depends on which parent passed the gene to the offspring, through a phenomenon known as...
Oxidation Numbers
Alkali Metals
Table 1: Properties of the alkali metals
Oxidation-Reduction Reactions
Residual Plots
When the residual values are plotted against the variable x, it is called a residual...

