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Advanced optical metrology is crucial for X-ray optics used in synchrotrons and free-electron lasers. A new stitching interferometry technique enhances surface topography measurement accuracy for both flat and curved optical components.

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Area of Science:

  • Applied Physics
  • Optical Engineering
  • Metrology

Background:

  • Stringent specifications for X-ray optical components necessitate advancements in metrology and polishing.
  • Achieving nanometer-level residual figure errors is critical for synchrotron and free-electron laser beamlines.
  • Accurate surface topography measurement over the entire clear aperture is essential for optical performance.

Purpose of the Study:

  • To develop and extend optical metrology techniques for high-precision X-ray optics.
  • To enhance the measurement accuracy of Fizeau interferometers for various optical geometries.
  • To present novel applications of stitching interferometry for optical component characterization.

Main Methods:

  • Development of a stitching interferometry system initially for long flat mirrors using a Fizeau interferometer.
  • Extension of capabilities to characterize moderately curved optics with a transmission flat element.
  • Application of micro-stitching interferometry for improved measurement accuracy on short plane mirrors.

Main Results:

  • Routine generation of 2D surface topography maps for optical components.
  • Successful characterization of a spherical mirror with a 120 m radius of curvature.
  • Demonstrated improvement in measurement accuracy for short plane mirrors using micro-stitching.

Conclusions:

  • The developed stitching tool effectively measures surface topography for demanding X-ray optical applications.
  • The extended capabilities enable characterization of both flat and curved optical surfaces.
  • Stitching interferometry offers a novel approach to enhance measurement accuracy in optical metrology.