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Subnanometer localization accuracy in widefield optical microscopy
Craig R Copeland1,2, Jon Geist3, Craig D McGray3
11Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
Light, Science & Applications
|March 7, 2019
Summary
This study introduces novel reference materials and calibration methods for optical microscopy, achieving atomic-scale localization accuracy. This breakthrough addresses overconfidence in measurements and enhances nanoscale precision for critical applications.
Area of Science:
- Optical Microscopy
- Nanotechnology
- Metrology
Background:
- Overconfidence in localization microscopy measurements is common due to uncalibrated systems and the assumption that precision limits accuracy.
- Microscale systematic errors can invalidate nanoscale statistical uncertainties in localization microscopy.
- Existing calibration methods for optical microscopes are often insufficient for achieving high accuracy.
Purpose of the Study:
- To develop a comprehensive solution for accurate localization microscopy.
- To create the first reference materials enabling atomic-scale localization errors.
- To establish subnanometer localization accuracy in widefield optical microscopy.
Main Methods:
- Development of subresolution aperture arrays as reference materials.
- Novel calibration methods for microscope systems using aperture arrays.
- Aberration corrections to match the precision limit of reference materials.
- Correction and registration of multi-color localization data.
Main Results:
- Achieved localization errors approaching the atomic scale across a submillimeter field.
- Demonstrated general applicability of reference materials and calibration methods across different light sources.
- Introduced critical-dimension localization microscopy for nanofabrication testing and quality control.
- Applied reference materials to investigate the stability of fluorescent nanoparticles.
Conclusions:
- Established a foundation for subnanometer localization accuracy in widefield optical microscopy.
- Provided a comprehensive solution to overconfidence in localization microscopy measurements.
- Enabled precise testing of nanofabrication processes and quality control of nanostructures.
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