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Updated: Jan 27, 2026

Residue-Free Fabrication of van der Waals Heterostructures of Two-Dimensional Materials
Published on: July 18, 2025
Ultrahigh-Detectivity Photodetectors with Van der Waals Epitaxial CdTe Single-Crystalline Films
Qin Lian1, Xuanting Zhu1, Xudong Wang2
1Key Laboratory of Polar Materials and Devices (MOE) and Department of Optoelectronics, East China Normal University, Shanghai, 200241, P. R. China.
Abstract:
Van der Waals epitaxy (vdWE) is crucial for heteroepitaxy of covalence-bonded semiconductors on 2D layered materials because it is not subject to strict substrate requirements and the epitaxial materials can be transferred onto various substrates. However, planar film growth in covalence-bonded semiconductors remains a critical challenge of vdWE because of the extremely low surface energy of 2D materials. In this study, direct growth of wafer-scale single-crystalline cadmium telluride (CdTe) films is achieved on 2D layered transparent mica through molecular beam epitaxy. The vdWE CdTe films exhibit a flat surface resulting from the 2D growth regime, and high crystal quality as evidenced by a low full width at half maximum of 0.05° for 120 nm thick films. A perfect lattice fringe appears at the interfaces, implying a fully relaxed state of the epitaxial CdTe films correlated closely to the unique nature of vdWE. Moreover, the vdWE CdTe photodetectors demonstrate not only ultrasensitive optoelectronic response with optimal responsivity of 834 A W-1 and ultrahigh detectivity of 2.4 × 1014 Jones but also excellent mechanical flexibility and durability, indicating great potential in flexible and wearable devices.
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