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Related Concept Videos

Beams01:30

Beams

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Beams are integral components of structural engineering and construction, designed to support loads applied at various points along their length. These long, straight members can be classified based on geometry, cross-section, support type, and equilibrium condition.
Based on geometry, beams can be straight, tapered, or curved. Straight beams are the most common type and have a constant cross-section throughout their length. Tapered beams, on the other hand, have a varying cross-section along...
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Electron Carriers01:24

Electron Carriers

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Electron carriers can be thought of as electron shuttles. These compounds can easily accept electrons (i.e., be reduced) or lose them (i.e., be oxidized). They play an essential role in energy production because cellular respiration is contingent on the flow of electrons.
Over the many stages of cellular respiration, glucose breaks down into carbon dioxide and water. Electron carriers pick up electrons lost by glucose in these reactions, temporarily storing and releasing them into the electron...
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Deflection of a Beam01:19

Deflection of a Beam

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Accurately determining beam deflection and slope under various loading conditions in structural engineering is crucial for ensuring safety and structural integrity. Singularity functions offer a streamlined approach to analyzing beams, especially when multiple loading functions complicate the bending moment equation.
Singularity functions, described in an earlier lesson, are powerful mathematical tools that represent discontinuities within a function commonly encountered in structural loading...
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Prismatic Beams: Problem Solving01:15

Prismatic Beams: Problem Solving

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In the design of a supported timber beam subjected to a distributed load, both the beam's physical dimensions and the timber's characteristics, such as its grade and species, are critical. These factors determine the allowable stress values, which are crucial for calculating the necessary beam depth to ensure structural integrity and safety.
The design begins with analyzing the beam as a free body to identify moments and force balances, thereby determining support reactions. Next, the...
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Principal Stresses in a Beam01:11

Principal Stresses in a Beam

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In prismatic beams subject to arbitrary transverse loading, It is essential to analyze the interaction between shear forces and bending moments in order to understand stress distribution and ensure structural integrity. The highest normal or bending stress occurs at the outer fibers of the beam, decreasing linearly to zero at the neutral axis. In contrast, shear stress peaks at the neutral axis and diminishes toward the outer surfaces.
Analyzing principal stresses is crucial, especially in...
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Beams with Symmetric Loadings01:15

Beams with Symmetric Loadings

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The moment-area method is an analytical tool used in structural engineering to determine the slope and deflection of beams under various loads. Consider a cantilever with a concentrated load and moment at the free end. The first step is constructing a free-body diagram to calculate the reactions at the fixed end. Next, the bending moment diagram is plotted to visualize how the bending moment varies along the beam's length, focusing on points where the bending moment equals zero.
The M/EI...
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Related Experiment Video

Updated: Jan 26, 2026

Focussed Ion Beam Milling and Scanning Electron Microscopy of Brain Tissue
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Electron beam-based metrology after CMOS.

J A Liddle1, B D Hoskins1, A E Vladár1

  • 1National Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA.

APL Materials
|April 16, 2019
PubMed
Summary
This summary is machine-generated.

Electron-beam metrology faces challenges for post-CMOS technologies like directed self-assembly and nanophotonics. While electron-beam methods are promising for nanoscale measurements, many solutions for new metrology requirements are still under development.

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Electrical Engineering

Background:

  • Post-CMOS technologies, including directed self-assembly, nanophotonics/plasmonics, and resistive switches, present new metrology demands.
  • Emerging materials, devices, and architectures require advanced measurement capabilities.

Purpose of the Study:

  • To review the challenges in electron-based metrology for post-CMOS technologies.
  • To examine the suitability of electron-beam techniques for emerging metrology requirements.

Main Methods:

  • Review of challenges in electron-based metrology.
  • Examination of electron-beam techniques against new metrology requirements.
  • Analysis of exemplar post-CMOS technologies.

Main Results:

  • Post-CMOS technologies necessitate metrology for defect detection (subsurface, soft materials), accurate dimensional measurements (nanophotonics), contamination-free surface analysis, and state change identification (memory elements).
  • Electron-beam techniques offer strong signal interaction for nanoscale metrology.
  • Many solutions for these new metrology challenges are yet to be demonstrated.

Conclusions:

  • Electron-beam metrology is crucial for advancing post-CMOS technologies.
  • Further development is needed to address the specific metrology requirements of emerging nanotechnologies.
  • Potential solutions are identified within the scope of current electron-beam capabilities.