Related Experiment Video
Updated: Jan 25, 2026

Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
Effect of Interface Traps on the Device Performance of InGaAs-Based Gate-All-Around Tunneling Field-Effect
Won Douk Jang1, Young Jun Yoon1, Min Su Cho1
1School of Electronics Engineering Kyungpook National University, Daegu 41566, Republic of Korea.
Abstract:
The effect of interface traps on InGaAs-based vertical gate-all-around (GAA) tunneling field-effect transistors (TFETs) has been investigated using technology computer-aided design (TCAD) simulation. The interface traps distributed within different energy levels (E) in the energy bandgap of a semiconductor material exhibit various influences on the device performances. In this work, InGaAs-based TFETs are simulated to analyze the effects on the on-state current (Ion), off-state current (Ioff), threshold voltage (Vth), subthreshold swing (SS), and the ambipolar characteristics according to E and type of the interface traps. We have confirmed that Ioff and SS are degraded by the interface traps. Further, it can be shown that Ion is mainly affected by the acceptor-like traps and ambipolar behavior is affected by the donor-like traps. All the effects increase as E becomes closer to the midgap. The effects of the interface traps with gate underlap and overlap at the source-channel region also have been investigated, considering the device fabrication. Additionally, the analysis of the effect of junction trap created at the source-channel junction has been performed.
More Related Videos
Related Concept Videos
Field Effect Transistor
Social Traps
Bipolar Junction Transistor
Protein-protein Interfaces
Design Example: Identifying the Locations of Monuments in the Field Using Global Positioning System Device
Ligand-Gated Ion Channel Receptor: Gating Mechanism

