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Published on: June 25, 2020
Graphene Schottky Junction on Pillar Patterned Silicon Substrate
Giuseppe Luongo1,2, Alessandro Grillo3, Filippo Giubileo4
1Physics Department "E. R. Caianiello", University of Salerno, via Giovanni Paolo II n. 132, 84084 Fisciano, Italy. giluongo@unisa.it.
Abstract:
A graphene/silicon junction with rectifying behaviour and remarkable photo-response was fabricated by transferring a graphene monolayer on a pillar-patterned Si substrate. The device forms a 0.11 eV Schottky barrier with 2.6 ideality factor at room temperature and exhibits strongly bias- and temperature-dependent reverse current. Below room temperature, the reverse current grows exponentially with the applied voltage because the pillar-enhanced electric field lowers the Schottky barrier. Conversely, at higher temperatures, the charge carrier thermal generation is dominant and the reverse current becomes weakly bias-dependent. A quasi-saturated reverse current is similarly observed at room temperature when the charge carriers are photogenerated under light exposure. The device shows photovoltaic effect with 0.7% power conversion efficiency and achieves 88 A/W photoresponsivity when used as photodetector.
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