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Updated: Aug 15, 2026

Optimized Fabrication Procedure for High-Quality Graphene-based Moiré Superlattice Devices
Published on: July 11, 2025
Reducing metal-induced optical loss in graphene-on-silicon-nitride electro-absorption modulators
Segmented metal contacts significantly reduce optical loss in graphene-on-silicon-nitride modulators. This optimization enhances performance for complementary metal-oxide-semiconductor (CMOS)-compatible photonic integrated circuits.
Area of Science:
- Photonics
- Materials Science
- Electrical Engineering
Background:
- Metal-induced absorption in graphene-on-silicon-nitride (Si3N4) modulators limits performance.
- Evanescent coupling to metallic gate electrodes causes optical loss near the waveguide core.
Purpose of the Study:
- To systematically investigate the impact of electrode geometry and proximity on modulator performance.
- To reduce metal-induced optical loss in dual-layer graphene modulators on a Si3N4 platform.
Main Methods:
- Utilized three-dimensional electromagnetic simulations.
- Conducted experimental measurements on fabricated modulators.
- Compared continuous bar electrodes with segmented via-type contacts.
Main Results:
- Reduced metal-induced attenuation from 0.36 dB/µm to 0.09 dB/µm.
- Maintained graphene absorption at approximately 0.16 dB/µm.
- Achieved a modulation slope of ~1 dB/V at 1.31 µm with optimized via contacts.
Conclusions:
- Segmented via-type contacts effectively minimize metal-induced optical loss.
- Established design rules for electrode geometry and spacing to reduce optical loss.
- Provides a pathway for developing advanced CMOS-compatible graphene modulators with lower loss for integrated photonics.
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