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Related Experiment Video

Updated: Jan 25, 2026

Stretching Micropatterned Cells on a PDMS Membrane
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SU8 etch mask for patterning PDMS and its application to flexible fluidic microactuators.

Benjamin Gorissen1, Chris Van Hoof2, Dominiek Reynaerts1

  • 1Department of Mechanical Engineering, Katholieke Universiteit Leuven & Flanders Make, Celestijnenlaan 300B, 3001 Leuven, Belgium.

Microsystems & Nanoengineering
|May 7, 2019
PubMed
Summary

A new lithography and etching method allows for precise patterning of thick polydimethylsiloxane (PDMS) films. This technique overcomes limitations of previous methods, enabling advanced microfluidic and microrobotic device fabrication.

Keywords:
PDMS lithographySU8bending actuatoretch maskfluidic actuatormicroactuator

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Area of Science:

  • Materials Science
  • Microfabrication
  • Polymer Science

Background:

  • Polydimethylsiloxane (PDMS) is widely used in microsystems like microfluidics and soft microrobotics.
  • Current PDMS processing relies on replication molding, limiting advanced patterning capabilities.
  • Existing lithography methods using metal hardmasks and reactive ion etching (RIE) face challenges with surface roughness and etch selectivity.

Purpose of the Study:

  • To develop a novel lithography and etching process for patterning thick PDMS films.
  • To overcome the limitations of existing methods, such as metal redeposition and poor etch selectivity.
  • To enable the fabrication of advanced PDMS-based microdevices, including fluidic microactuators.

Main Methods:

  • Utilized a combination of LOR and SU8 photoresists as a hardmask for PDMS patterning.
  • Employed reactive ion etching (RIE) for patterning thick PDMS layers.
  • Fabricated flexible fluidic microactuators using the developed lithography process.

Main Results:

  • Achieved patterning of 1.5-μm pillars in PDMS with an etch selectivity of 3.4.
  • Demonstrated successful lithographic processing of flexible fluidic microactuators without manual steps.
  • The fabricated microactuators exhibited bidirectional rotation of 50° at 200 kPa.

Conclusions:

  • The LOR/SU8 photoresist combination provides an effective method for patterning thick PDMS layers via RIE, avoiding redeposition issues.
  • This technique enables the fabrication of complex PDMS microdevices, such as microactuators, with improved precision and scalability.
  • The developed process offers a unique pathway for miniaturizing PDMS-based actuators and other microsystems.